OTHER
ISO 8181:2023
ISO 8181:2023, titled "Atomic layer deposition — Vocabulary," is an international standard that defines general terms and processes related to Atomic Layer Deposition (ALD)
This standard contributes to Sustainable Development Goal 9: Industry, Innovation, and Infrastructure, by promoting standardized practices in advanced manufacturing processes
📄 Document
Title: APPLICATION FORM OF ISO 8181:2023
📜 Document Instructions:
Please fill the application form and upload required documents online for ISO Certification.
